Indentation University Session 12: How to Test Low-k Films on Silicon

Session 12 of the KLA Instruments Indentation University series includes a practical demonstration of low-k film measurement using nanoindentation, with an example low-k film on a silicon substrate. This demonstration session offers a practical example of the theory covered in session 11.

About this Webinar

Session 12 begins with a brief overview of the importance of low-k film properties for semiconductor device integrity. Sample preparation is demonstrated along with loading the sample tray into the iMicro nanoindenter.

The AccuFilm Thin Film Option Pack, with Dynamic Constant Strain Rate (CSR) included, is used to streamline the measurement and analysis process. Measurement results are reviewed and discussed.

Note: for Session 12, it is recommended to view the following Indentation University webinars as background for the discussion:

Session 12 of the Indentation University series helps you:

  • Understand the importance of mechanical integrity to semiconductor device films
  • Get tips on sample preparation techniques
  • Learn how to measure low-k films using the iMicro nanoindenter
  • Review data from measurements of low-k film on silicon

About the Speaker

Jennifer Hay, Senior Applications Scientist, KLA Instruments

Jennifer Hay is formerly a Senior Applications Engineer at KLA Instruments, specializing in nanoindentation. Prior to joining KLA, she held similar positions at Nanomechanics, Keysight, Agilent, and MTS Systems Corporation.

Jennifer has worked in the field of nanoindentation since 1996, advancing standardization while also developing methodology for new applications, such as gels, polymers, thin films, and biomaterials. 

She served as chair of the MEMS/Nanomechanics technical division of the Society of Experimental Mechanics (SEM), and has authored numerous journal articles on nanoindentation, including an invited feature series in the SEM journal Experimental Techniques.

Who Should Attend

This webinar is designed for nanoindenter users interested in measuring the mechanical properties of thin films.

More Articles From KLA Instruments

ISO 14577 Standardized Nanoindentation

Young’s Modulus and Hardness of Thin Low-k Films Using Nanoindentation

Measuring Substrate-Independent Young’s Modulus of Hard Overcoats for Magnetic Media Using a Nano Indenter

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