ONH836 Series Oxygen/Nitrogen/Hydrogen Analyzer

The ONH836 Oxygen/Nitrogen/Hydrogen Elemental Analyzer is designed by LECO Corporation for measuring the content of nitrogen, oxygen, and hydrogen in ferrous and non-ferrous alloys, inorganic materials, and refractory materials using the inert gas fusion technique.

A custom MS Windows-based software interface is built into the analyzer for carrying out the touch-screen operation. This software is very easy to use and allows the user to access analysis settings, instrument control, reporting and diagnostics.

Key Features

The key features of the ONH836 Oxygen/Nitrogen/Hydrogen Elemental Analyzer are:

Integral Sample Loading Area

  • Simplifies routine sample drop mechanism maintenance
  • New quick-change disk filter assembly
  • Minimizes atmospheric contamination while introducing the sample.

Reliable Automation

  • Optional 20-crucible batch loader is available
  • Optional autocleaner removes the need to manually clean between samples.

Additional Features and Benefits

  • Compatible with SmartLine Remote Diagnostics
  • Pressure-compensated and temperature-controlled gas dose system
  • Boom-mounted touch interface.

Advanced Features

  • Infrared (IR) and thermal conductivity (TC) detectors
  • Bypassable OMI-2 carrier gas scrubber for increasing TC cell stability
  • Triple IR cells are available for detecting oxygen
  • Patented dyanamic flow compensation further enhances TC cell stability.

Special Purpose Derivatives

H836EN Model

  • High accuracy analysis of low-level hydrogen in aluminum; titanium, ferrous, and other alloy kinds
  • Software assistance for stepped temperature furnace profiles assisting the speciation of surface and bulk hydrogen of aluminum
  • EN sample drop, an upper electrode, and crucibles have been developed to support bigger low-level samples like aluminum slugs or depleted uranium pellets
  • Substitute for RHEN602 Hydrogen Determinator

O836Si Model

  • Perfect for oxygen detection in the metals, electronics (high purity copper), and silicon industries (silicon wafers)
  • Unmatched low-level sensitivity with solid-state infrared detection, novel sample loading, and programmable impulse furnace

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