FUJIFILM Corporation (President: Shigehiro Nakajima) and imec (CEO: Luc Van den hove) have developed a new photoresist1 technology for organic semiconductors2 that enables the realization of submicron3 patterns.
Due to their lightness, flexibility, and the possibility to manufacture them in large area, research and development on organic semiconductors has intensified in recent years. Organic semiconductors can be used in various applications such as organic solar cells, flexible displays, organic photodetectors and various other types of sensors.
Current methods for patterning organic semiconductors include shadow masking4 and inkjet printing5. However, these patterning methods are not suitable for high-resolution patterning on large-size substrates. Patterning based on photolithography6 would solve this issue. But photolithography is currently mainly adopted for patterning of silicon semiconductors. When applying it to organic semiconductors using standard photoresists, the photoresist dissolves the organic semiconductor material during processing.
Fujifilm and imec have developed a new photoresist technology that enables submicron patterning on large-size substrates without damaging the organic semiconductor materials. The new photoresist technology was developed by fusing the semiconductor processing technology of Fujifilm and imec, with Fujifilm’s synthetic-organic chemistry material design technology. Since existing i-line photolithography equipment can be used, and investment for new equipment is unnecessary, the new technology contributes to a cost-effective production of high-resolution organic semiconductor devices.
For technical verification, Fujifilm and imec developed organic photo detectors (OPD)7 and organic light-emitting diodes (OLED)8 using the new photolithography technology, and tested their performance. Organic semiconductor materials were patterned to produce OPD composed of fine light receiving elements down to 200μm×200μm size.
Generally, patterning of organic semiconductor materials degrades the property of converting light into electricity (photoelectric conversion property), but the OPD developed in this case were patterned without degradation. With respect to the OLED arrays that were produced using the newly developed photolithography pattering method: 20μm pitch OLEDs emitting uniform light, were realized.
Fujifilm and imec will continue to contribute to industrialization of organic electronics by advancing research and development of semiconductor materials, processing technology and system integration.
About FUJIFILM Corporation
FUJIFILM Corporation is one of the major operating companies of FUJIFILM Holdings. Since its founding in1934, the company has built up a wealth of advanced technologies in the field of photo imaging, and Fujifilm is now applying these technologies to other new business fields.
Fujifilm brings continuous innovation and leading-edge products to a broad spectrum of industries including medical systems / life sciences, graphic arts, document solutions, highly functional materials such as electronic materials, optical devices and digital imaging. Fujifilm aims to help enhance the quality of life of people worldwide by providing top-quality products and services with its leading-edge, proprietary technologies. Through its corporate philosophy, Fujifilm demonstrates its commitment to making a significant contribution to society.
Imec performs world-leading research in nanoelectronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China, India and Japan. Its staff of more than 2,000 people includes more than 650 industrial residents and guest researchers. In 2012, imec's revenue (P&L) totaled 320 million euro.
Photoresist: Photosensitive materials that cause photochemical reaction due to light exposures, have different developer solubility at exposed parts and unexposed parts, and are used for microfabrication in semiconductor production.
Organic semiconductor: Small molecule organic compounds and polymers carrying the property of a semiconductor.
Submicron: 1/10000mm. 1/10 micron.
Shadow masking method: Patterning by evaporating materials from above the shadow mask (shielding mask) patterned with holes.
Inkjet printing method: Patterning by injecting material particles from the inkjet nozzle.
Photolithography method: A film is formed by coating photoresist onto the substrate to be processed, and photochemical reaction occurs within the resist film by exposing patterns through the mask. This microfabrication method forms a mask-like resist pattern on the substrate through development, and transfers the resist pattern onto the substrate as protective material for etching.
Organic photo detector: Photodetection element using organic semiconductors.
Organic light-emitting diode: Light-emitting elements using organic semiconductors.