Veeco Introduces Next Generation Metal Organic Chemical Vapor Deposition Gallium Nitride Platform

Veeco Instruments Inc., announced the introduction of its new TurboDisc(R) "K-series" Metal Organic Chemical Vapor Deposition (MOCVD) gallium nitride (GaN) platform for the production of high-brightness light-emitting diodes (HB-LEDs). The Company received orders for five new systems from three leading manufacturers of HB-LEDs totaling approximately $10 million.

Veeco's new TurboDisc "K-series" MOCVD platform includes the K300 and K465 models, offering a modular, upgradeable path to higher throughput, larger diameter reactor chamber and reduced cost of ownership. The K465 features Veeco's most advanced reactor technology, offering approximately 50% greater throughput compared to currently available competitive MOCVD production tools.

Edward H. Braun, Chairman and CEO of Veeco, commented, "Veeco's new multi-generational platform and larger reactor capability will give our HB-LED customers a long-term cost of ownership advantage plus the technology to achieve their LED brightness roadmap objectives. We continue to anticipate strong Veeco growth in this market as HB-LED's experience adoption in applications such as automotive, architectural lighting and backlighting for laptops and LCD-TVs. Veeco will continue to partner with our customers to deliver innovative technology solutions and world-class process and applications support as the industry advances towards solid state lighting."

Piero Sferlazzo, Vice President, General Manager of Veeco's MOCVD operations, commented, "Our new modular system, which is extendable to larger reactors, is the only platform capable of continuous operation available on the market today. Couple that with the excellent uniformity and repeatability of the TurboDisc technology, our customers now have a true, multi-generational, high volume production MOCVD system to meet their needs today and in the future."

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