TFT-LCD equipment grew 30% in 2008 but will drop 41% in 2009, according to the report LCD Market: Technology Directions and Market Analysis, recently published by The Information Network a New Tripoli, PA-based market re...
The Textile Industry Research Association AITEX is organizing “New Textiles. R&D in the Textile – Clothing - Technical Textiles Industry”, an Information Day which will take place on 31 March 2009 i...
The New Materials and Supramolecular Spectroscopy research team at the Department
of Physical Chemistry in the Faculty of Sciences and Technology of the UPV/EHU
is a pioneering one in the investigation of hydrogels and is led by Dr. Issa
A. Katime, author of the only book published in Spanish on the topic. At present,
they are using hydrogels to release pharmaceutical drugs in a controlled manner.
President Barack Obama's pursuit of energy independence promises to accelerate research and development for alternative energy sources -- solar, wind and geothermal power, biofuels, hydrogen and biomass, to name a fe...
Chemistry researchers at the University
of Warwick have found that tiny nanoparticles could be twice as likely to
stick to the interface of two non mixing liquids than previously believed.
Zeus, Inc. announces a new technology platform in the field of electrospinning, a process that produces polymer fibers with thicknesses ranging from the nano to microscale. Zeus is able to develop fabrics with complex sh...
Semiconductor Research Corporation (SRC), the world's leading university-research consortium for semiconductors and related technologies, and IMEC, Europe's leading independent nanoelectronics research center, in...
Javelin Design Automation, provider of PathFinding solutions, announces a revolutionary solution for the rapid design exploration and optimization of three dimensional stacked ICs (3D SIC). Developed in close collaborati...
The Swiss Chemical Society presented its prestigious Sandmeyer Prize to a
team of Empa researchers, this
award being given annually in recognition of outstanding work in the field of
applied chemistry.
Without robust and affordable next-generation lithography, the current semiconductor roadmap could change dramatically. For 22nm and beyond, patterning candidates such as EUVL*, nano-imprint, direct write and optical dou...
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