Feb 16 2010
Leti, in collaboration with CNRS/LTM, STMicroelectronics and IMEC, is organizing the 3rd Plasma Etch and Strip in Microelectronics workshop March 4-5 at MINATEC in Grenoble.
The PESM2010 workshop, which will explore recent advances in etching and stripping processes for nanoelectronics technologies, presents a unique opportunity to meet with an international gathering of researchers in the field of plasma etch and strip.
The program includes presentations on plasma-surface interaction, plasma diagnostics, plasma etching for interconnects, post-etch strip and clean and deep plasma etching at the state of the art. Invited papers will be given by scientists in the etching plasma field representing leading companies and research institutes such as IBM, Tokyo Electron Ltd., LAM Research, the Institute of Microelectronics, Penn State University and the laboratory for Microelectronics Technologies (LTM) at the National Center for Scientific Research (CNRS).