Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications, 2nd Edition

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications, 2nd Edition

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology.

The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Click here for more information.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this content?

Leave your feedback
Submit