EVG®720: Automated SmartNIL® UV Nanoimprint Lithography System

The EVG720 UV nanoimprint lithography system leverages EVG’s novel SmartNIL technology and materials expertise to facilitate mass manufacturing of micro- and nanoscale structures.

The EVG720 system can print nanostructures as small as 40 nm* over a huge area with a low cost of ownership and matchless throughput. Thanks to its SmartNIL technology, it is perfectly suited for volume production of next-generation microfluidic and photonic devices, like diffractive optical elements (DOEs).

*Resolution is based on process and template

Features

  • Volume-proven imprinting technology available with excellent replication fidelity
  • Optional top-side alignment
  • Proprietary SmartNIL® technology comes with multiple-use polymer stamp technology
  • UV curing demolding, combined imprinting and working stamp fabrication
  • Scalability ensured from R&D to production
  • Automated cassette-to-cassette handling together with semi-automated R&D mode
  • Comes with optional mini-environment
  • System housing offered for the most optimal process reliability and stability
  • Open platform is provided for all commercially available imprint materials

Technical Data

. .
Wafer diameter (substrate size) 75 up to 150 mm
Resolution ≤40 nm (resolution dependent upon template and process)
Supported Process SmartNIL®
Exposure source High-power LED (i-line) > 400 mW/cm²
Alignment Optional top side alignment
Automated separation Supported
Mini environment and climate control Optional
Working stamp fabrication

Supported


​Source: EV Group

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