The EVG720 UV nanoimprint lithography system leverages EVG’s novel SmartNIL technology and materials expertise to facilitate mass manufacturing of micro- and nanoscale structures.
The EVG720 system can print nanostructures as small as 40 nm* over a huge area with a low cost of ownership and matchless throughput. Thanks to its SmartNIL technology, it is perfectly suited for volume production of next-generation microfluidic and photonic devices, like diffractive optical elements (DOEs).
*Resolution is based on process and template
Features
- Volume-proven imprinting technology available with excellent replication fidelity
- Optional top-side alignment
- Proprietary SmartNIL® technology comes with multiple-use polymer stamp technology
- UV curing demolding, combined imprinting and working stamp fabrication
- Scalability ensured from R&D to production
- Automated cassette-to-cassette handling together with semi-automated R&D mode
- Comes with optional mini-environment
- System housing offered for the most optimal process reliability and stability
- Open platform is provided for all commercially available imprint materials
Technical Data
| . |
. |
| Wafer diameter (substrate size) |
75 up to 150 mm |
| Resolution |
≤40 nm (resolution dependent upon template and process) |
| Supported Process |
SmartNIL® |
| Exposure source |
High-power LED (i-line) > 400 mW/cm² |
| Alignment |
Optional top side alignment |
| Automated separation |
Supported |
| Mini environment and climate control |
Optional |
| Working stamp fabrication |
Supported
|
Source: EV Group