EVG®610 UV: Nanoimprint Lithography Systems

The EVG610 UV nanoimprint lithography tool supports a range of standard lithography processes, like vacuum-, soft-, hard- and proximity exposure mode, including the choice of back-side alignment. The system provides extra abilities for multi-purpose configurations, such as nanoimprint lithography (NIL) and bond alignment.

Rapid processing and re-tooling are enabled by the EVG610 for changing user needs with just a few minutes of conversion time between lithography and NIL. The latest multi-user concept of the system can be adapted right from beginners to expert level, thereby making it perfect for universities and R&D applications.

In the case of imprint processes, the EVG610 enables substrates spanning from small chip size pieces up to a diameter of 150 mm. Configurations for nanotechnology applications comprise release mechanisms for stamps besides programmable high and low contact force. Even contact force for high yield imprinting is offered by EV Group’s proprietary chuck design, supporting both soft and hard stamps.


  • Comes with high-precision alignment stage
  • Top-side and bottom-side alignment capability available
  • Stepwise process guidance is offered
  • Automated wedge error compensation mechanism is provided
  • Reduced system footprint and facility needs
  • Motorized and recipe-controlled exposure gap
  • Remote tech support
  • Assists the new UV-LED technology
  • Agile processing and conversion between lithography processes can be performed
  • Multi-user concept (limitless number of user accounts and recipes, different user interface languages and assignable access rights)
  • Table-top or stand-alone version available with anti-vibration granite table
  • Additional capabilities:
    • µ-contact printing
    • Bond alignment
    • Nanoimprint lithography
    • IR alignment

Technical Data

. .
Wafer diameter
(substrate size)
Standard lithography: pieces up to 150 mm
Soft UV-NIL: pieces up to 150 mm
Resolution ≤ 40 nm (resolution dependent upon template and process)
Supported Process Soft UV-NIL
Exposure source Mercury light source or UV LED light source
Automated separation Not supported
Working stamp fabrication External

Source: EV Group

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