Compact Plasma Cleaning System - The Apoll

The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo plasma cleaning system is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF bias power as needed, difficult to remove layers of resist can be removed at low temperatures. As required by application, this system can incorporate the SST-Lightning microwave source (which is both reliable and free from typical microwave tuning problems) or ICP technology.

Specifications

  • Etch rates up to 6ìm/min
  • 100mm to 300mm wafers
  • High throughput
  • Small footprint
  • Low plasma damage
  • Competitively priced
  • Self-tuning

Applications

  • MEMS
  • Compound Semiconductor
  • Pilot Line Production.

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