Ultra-Fast Real-Time Semiconductor AMC Monitors

Efficiently monitor both established and new contaminants across various molecular categories with high sensitivity, precision, and reliability.

Traditional Airborne Molecular Contaminant (AMC) monitoring solutions often require multiple sensors to comprehensively monitor the required range of compounds. TOFWERK Semicon AMC Monitors, however, offer a single-solution approach that enables robust and simultaneous measurement of various AMC categories.

Real-Time Monitoring

Recognize and promptly respond to early-stage contamination events.

Robust Coverage

Simultaneous, ultra-fast measurements of acids, bases, condensables, and volatile organic compounds (VOCs).

Ultra-Fast Real-Time Semiconductor AMC Monitors

Image Credit: TOFWERK

Single-Digit, Part-Per-Trillion LODs

Sensitive detection for the lowest concentrations.

Source: TOFWERK

AMC CAS Molecule 2s LOD (ppbv) 1 min LOD (ppbv)
Propylene glycol methyl
ether acetate (PGMEA)
108-65-6 C6H12O3 0.0065 0.0012
Propylene glycol methyl ether (PGME) 107-98-2 C4H10O2 0.052 0.0094
Methyl Ethyl Ketone (MEK) 78-93-3 C4H8O 0.421 0.075
Ethyl Acetate (EA) 141-78-6 C4H8O2 0.104 0.019
Cyclopentane 287-92-3 C5H10 0.132 0.023
Acetone 67-64-1 C3H6O 0.002 0.0009
Toluene 108-88-3 C7H8 0.012 0.003
Ammonia 7664-41-7 NH3 0.408 0.072
Hydrogen fluoride 7664-39-3 HF 0.011 0.0002
Hydrochloric acid 132228-87-6 HCl 0.526 0.095
Nitric acid 7697-37-2 HNO3 0.0072 0.0013
Chlorine 7782-50-5 Cl2 0.001 0.0002

 

Comprehensive Contamination Control Throughout the Fab.

FOUP Monitoring

One of the biggest contamination risks in the fab is during the transportation of Front Opening Unified Pods from one process to the next. The sensitivity, speed, and coverage of AMC screening set a limit on FOUP cleanup.

Ultra-Fast Real-Time Semiconductor AMC Monitors

Image Credit: TOFWERK

Facility Monitoring

Semiconductor manufacturing consists of many independent processes. Sensitive AMC monitoring is a critical component of the fab infrastructure, particularly when it comes to catching early-stage contamination events.

Ultra-Fast Real-Time Semiconductor AMC Monitors

Image Credit: TOFWERK

Mobile Analysis

Semicon AMC Monitors are uniquely versatile and designed for easy integration across various fab settings. They enable in-situ mobile measurements for accurate AMC control and effective leak detection, particularly for sticky and reactive substances.

Ultra-Fast Real-Time Semiconductor AMC Monitors

Image Credit: TOFWERK

Immediate Hazard Detection

Material Off-Gassing in an ISO 5 Microtechnology Cleanroom

The material underwent a purge with Clean Dry Air (CDA) and was measured directly. Each time series shows simultaneous compound measurements with three different ionization chemistries.

Ultra-Fast Real-Time Semiconductor AMC Monitors

Image Credit: TOFWERK

A toluene and ammonia leak was identified in an ISO 5 fine chemical cleanroom.

Ultra-Fast Real-Time Semiconductor AMC Monitors

Image Credit: TOFWERK

Features

A full toolkit for efficient AMC management.

Real-Time Monitoring

Quickly detect and react to early-stage contamination events.

Fabs host hundreds of processes that can produce unwanted contaminants. When there is a leak or process failure, live and fast AMC reporting helps manufacturers respond quickly to and resolve contamination events.

Part-Per-Trillion Detection Limits

Extremely sensitive, ensuring that no signal is missed.

As the technology node continues to decrease, the impact trace AMCs have on production yield is amplified. Monitoring systems that do not achieve part-per-trillion detection levels are deemed insufficient when it comes to offering effective protection against contamination incidents.

Robust Coverage

Simultaneously measure Acids, Bases, Condensables, and VOCs.

AMCs are composed of a variety of molecular classes. Conventional technologies are unable to measure all relevant categories and often require a suite of instrumentation to provide adequate coverage. Semicon AMC Solutions, on the other hand, can provide comprehensive, real-time coverage for the molecular classes that pose a critical risk to semiconductor manufacturing processes.

Flexible Configurations

A solution for every application.

Semicon AMC Monitors can be specifically tailored to meet any application requirements, whether it is for monitoring fabrication process chemical leaks, assessing Front Opening Unified Pods (FOUPs) for quality control, or performing mobile facility analyses.

Customizable Target Lists

Evolves with your interests.

Monitor all critical AMCs and then continuously expand the scope to include additional ones as needed.

Retrospective Data Review

Thorough data inventory for future proof analysis.

Access to historical mass spectrum measurements is readily available. Review past incidents as new AMCs become of interest.

Specifications and Limits of Detection

TOFWERK Semicon AMC monitors are available in two versions that can be used separately or in tandem. Accessories are available for use in a variety of AMC monitoring applications.

ABC Configuration

The optimal solution for simultaneous monitoring of Acids, Bases, Condensables, and certain VOCs is provided by TOFWERK's patented fast polarity switching and Aim Reactor technology. This allows for the concurrent reporting of each compound class in the millisecond timescale, with minimal fragmentation.

ABC LODs (pptv 1 minute) for representative compounds. Source: TOFWERK

Substance Formula LOD (pptv 1 min)
Hydrofluoric acid HF 10
Nitric acid HNO₃ 5
Acetic acid HCOOH 10
Ammonia NH₃ 10
Dimethylamine (DMA) (CH₃)₂NH 5
Propylene glycol methyl ether acetate (PGMEA) C6H12O3 5
Toluene C7H8 5

 

VOC Configuration

TOFWERK's VOC configuration provides comprehensive monitoring for Volatile Organic Compounds. Compared to the ABC Configuration, the VOC configuration provides more robust measurements of VOCs using PTR mass spectrometry with pptV limits of detection.

VOC LODs (pptv 1 minute) for representative compounds. Source: TOFWERK

Substance Formula LOD (pptv 1 min)
Benzene C6H6 6.1
Isopropyl alcohol (IPA) C3H8O 9.6
Propylene glycol methyl ether acetate (PGMEA) C6H12O3 13.1
Ethyl acetate (EA) C4H8O2 11.4
Propylene glycol methyl ether (PGME) C4H10O2 13
Cyclopentane C5H10 10

 

System Specifications

Source: TOFWERK

. .
Library User Defined
Concentration Range ppqv-100 ppbv
Resolution >1000 M/ΔM
Limits of Detection 1-50 pptv
Analysis Cycle 40 kHz
Mode Switching 5 Hz
Operating Temperature 10-40 °C
Operating Humidity <90%
Certification CE

 

Limits of Detection

Source: TOFWERK

AMC CAS Molecule 2s LOD (ppbv) 1 min LOD (ppbv)
Propylene glycol methyl
ether acetate (PGMEA)
108-65-6 C6H12O3 0.0065 0.0012
Propylene glycol methyl ether (PGME) 107-98-2 C4H10O2 0.052 0.0094
Methyl Ethyl Ketone (MEK) 78-93-3 C4H8O 0.421 0.075
Ethyl Acetate (EA) 141-78-6 C4H8O2 0.104 0.019
Cyclopentane 287-92-3 C5H10 0.132 0.023
Acetone 67-64-1 C3H6O 0.002 0.0009
Toluene 108-88-3 C7H8 0.012 0.003
Ammonia 7664-41-7 NH3 0.408 0.072
Hydrogen fluoride 7664-39-3 HF 0.011 0.0002
Hydrochloric acid 132228-87-6 HCl 0.526 0.095
Nitric acid 7697-37-2 HNO3 0.0072 0.0013
Chlorine 7782-50-5 Cl2 0.001 0.0002

Other Equipment by this Supplier

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.