CVD/PECVD Tool for Growth of 1D/2D Nanomaterials - Nanofab

Oxford Instruments’ Nanofab offers CVD/PECVD tools for developing 1D/2D nanomaterials and heterostructures. The Nanofab ensures high-performance growth of nanomaterials with precise process control and in-situ catalyst activation.

  • Sample sizes of up to 200 mm
  • Exceptional uniformity with flexible temperatures of up to 1200 °C
  • Optional solid/liquid source delivery system for the growth of MoSe2, MoS2, and other TMDCs
  • Options of 700 °C, 800 °C, or 1200 °C table
  • Cold wall design with showerhead based uniform precursor delivery
  • Vacuum load lock enables samples to be quickly exchanged

Applications

  • 1D materials growth
  • 2D materials growth
  • Graphene growth
  • Carbon nano tube (CNT) growth
  • MoS2 growth
  • hBN Growth

CVD/PECVD Tool for Growth of 1D/2D Nanomaterials—Nanofab

Image 1. Image Credit: Oxford Instruments Plasma Technology
Image 2. Image Credit: Oxford Instruments Plasma Technology
Image 3. Image Credit: Oxford Instruments Plasma Technology
Image 4. Image Credit: Oxford Instruments Plasma Technology
Image 5. Image Credit: Oxford Instruments Plasma Technology

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