Chemical Vapor Deposition (CVD) and PECVD tools are available to grow 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) provides high-performance growth of nanomaterials with in-situ catalyst activation and strict process control, with adaptable temperatures up to 1200 °C.
![CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD](https://d12oja0ew7x0i8.cloudfront.net/images/equipments/EquipmentImage_7120_16753216902816847.jpg)
Image Credit: Oxford Instruments Plasma Technology
![CVD/PECVD Tool for Growth of 1D/2D Nanomaterials PlasmaPro 100 Nano CVD](https://d12oja0ew7x0i8.cloudfront.net/images/equipments/EquipmentImage_7120_16753216957582927.jpg)
Image Credit: Oxford Instruments Plasma Technology
Features
- Options of a 700 °C, 800 °C, or 1200 °C table
- Outstanding uniformity with flexible temperatures up to 1200 °C
- Vacuum load lock—Rapid sample exchange
- Optional liquid or solid source delivery system for growth of MoSe2, MoS2, and other TMDCs
- Sample size ranges up to 200 mm
- Cold wall design available with showerhead-based even precursor delivery
Applications
- MoS2 growth
- 2D materials growth
- hBN growth
- Carbon nanotube (CNT) growth
- 1D materials growth
- Graphene growth