KDF maintains an active cathode development program that integrates theoretical modeling, mechanical design, empirical measurement, and real-world process testing.
All current cathode models have undergone detailed simulation using advanced software, along with magnetic mapping and validation through process trials. New cathode designs—aimed at enhancing uniformity and improving target utilization—are in development and will be available soon.
LMM™ – Linear Moving Magnet Cathode:
The Linear Moving Magnet (LMM™) sputter cathode—KDF’s recently patented, full-face erosion rectangular design—is now available for all KDF systems. Its advanced engineering supports both RF and DC operation.
The LMM™ delivers high material utilization while minimizing re-deposition, helping reduce particulate contamination. Its enhanced design also enables reliable performance in DC pulse reactive sputtering across a wide range of materials.
For magnetic material applications, the Magterial™ version of the LMM™ offers exceptional utilization and extended lifetime, making it ideal for sputtering materials like nickel.
Mark II™
Originally an MRC cathode, KDF has since refined and optimized this magnetron cathode, making it ideal for reactive depositions of materials like indium-tin oxide or dielectric materials like SiO2.
Mark III™
Compared to the Mark II, KDF's second-generation cathode has a better magnet design for greater uniformity and a longer lifespan.
X SeriesTM
KDF’s most popular systems—the 600 and 900 Series—can now be upgraded with the latest generation of KDF cathodes. These new cathodes have been extended from 15 inches to 17 inches, delivering improved uniformity across the entire pallet.
The X Series cathodes are available in Planar, INSET™, and Magterial™ configurations to suit a range of application needs.
Inset Cathode™
Since acquiring MRC’s batch business in 1998, KDF has made significant enhancements to the original INSET™ cathode design, focusing on improved uniformity and higher material utilization.
KDF has also developed new, larger INSET™ cathodes for standard batch tools. The KDF 744 and 844 systems now support INSET™ cathodes up to 30.5 inches in length. The clamped material design is compatible with most metals, including all precious metal types.
Focest Cathode™:
The Focest Cathode™ was first created for Al deep trench fill. It provides excellent material utilization, rate, and uniformity. There are specific uses for this cathode in the 600/900 system family.
Magterial Cathode™:
This planar-style cathode is designed for magnetron sputtering of ferrous metals like nickel and iron, delivering high deposition rates with excellent uniformity. Its strong magnetic field supports the use of ¼-inch thick bonded magnetic targets, offering extended target life for these materials.
KDF is the only inline system manufacturer that designs its own cathodes across its entire product range—from the standard 5" x 15" and enhanced 5" x 17" models to the large-format 5" x 30" cathodes used in the 844 series.