MILA-5000 Series: Mini Lamp Annealer

The MILA-5000 series can perform high-speed cooling, clean heating, and high-speed heating, all of which are characteristic of the Infrared Gold Image Furnace.

It is a low-cost infrared light heating system that combines a temperature controller and a variable atmosphere chamber to heat materials under configurable atmospheres. A PC linked via USB may perform heating activities, and data management is simple with this equipment.

MILA-5000UHV

The MILA-5000UHV was developed as a concept that supports a high vacuum and enhances the features of the MILA-5000 series, including high-speed heating and cooling, accurate temperature control, clean heating, and variable atmosphere selection.

It is based on the MILA-5000-P-N (high-temperature type). A PC linked via USB may perform heating activities, and data management is simple.

MILA 5000 U TECH

Video Credit: Orton Ceramic Foundation

Applications

MILA-5000 Series

  • Ion implantation is followed by diffusion annealing and oxide film deposition annealing
  • Catalytic effect testing and temperature-programmed desorption testing
  • Uniform temperature annealing of the glass substrate
  • Crystal annealing of ferroelectric thin films
  • Silicon (Si) and compound wafers are sintered and alloyed
  • Thermal cycle, thermal shock, thermal fatigue testing

MILA-5000UHV

  • High-vacuum heat treatment
  • A temperature-controlled desorption gas analysis furnace

Features

MILA-5000 Series

  • 50 °C/second high-speed heating
  • Choose the desired atmosphere: vacuum, gas, gas flow, or air
  • Accurate temperature regulation
  • Small, tabletop style
  • Easy temperature recipe input into a USB-connected PC
  • Display temperature data on the PC monitor during heating

MILA-5000UHV

  • Easy input of the temperature recipe into a computer connected with a USB
  • Inherits the capabilities of the MILA-5000-P-N (high-temperature type)
  • Display temperature data on the PC monitor during heating
  • Heat treatment in a high-vacuum environment
  • Pumping as low as 10-4 Pa (when using TMP)
  • Small, tabletop design

Specifications

MILA-5000 Series

Source: Orton Ceramic Foundation

Model MILA-5000-P-N
(high-temperature type)
MILA-5000-P-F
(uniform-temperature type)
Temperature range RT ~ 1200 °C RT ~ 800 °C
Sample size □ 20 × t 2 (mm)
Atmosphere Air, low vacuum, gas flow
Process pressure More than 10 Pa ~ atmospheric pressure

*Vacuum pumping system is optional
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material

Uniform Heating Type

Source: Orton Ceramic Foundation

Model MILA-5000UHV
Temperature range RT ~ 1000 °C
Sample size □ 20 × t 2 (mm)
Atmosphere

Air, high vacuum, inert gas

Process pressure 10-4 Pa ~ atmospheric pressure

*Vacuum pumping system is optional
*Heating temperature changes according to the heated sample’s infrared reflectance, absorption, heat capacity, and material

Optional Feature Examples

CCD Camera Unit for Sample Observation

Installing the CCD camera unit for sample observation allows the user to capture real-time changes in the sample during heating on a PC.

The CCD Camera Unit can be installed for unit observation.

Image Credit: Orton Ceramic Foundation

Electrical Resistance Measurement Unit

Users can measure electrical resistance while heating the sample by swapping out the unit with the Electrical Resistance Measurement Unit and connecting it to their digital multimeter.

Electrical Resistance Measurement Unit

Image Credit: Orton Ceramic Foundation

Liquid Nitrogen Mist Rapid Cooling Unit

Rapid cooling from 1000 °C to 0 °C can be achieved in just two seconds when using liquid nitrogen mist spraying.

Liquid Nitrogen Mist Rapid Cooling Unit

Image Credit: Orton Ceramic Foundation

Video Credit: Orton Ceramic Foundation

High-Temperature Type

Graph showing MILA5000-P-N maximum heating rate using a nickel plate.

Image Credit: Orton Ceramic Foundation

MILA5000-P-N Maximum heating rate

Sample: 20 (W) × 20 (L) × 0.5 (t) (all mm) nickel plate

Atmosphere: Vacuum

Rating: 200 V 4 kW, 100 % output

Graph showing MILA5000-P-N Temperature uniformity with a nickel plate as a sample.

Image Credit: Orton Ceramic Foundation

MILA5000-P-N Temperature uniformity

Sample: 20 (W) × 20 (L) × 0.5 (t) (all mm) nickel plate

Atmosphere: Vacuum

TCKmeasuring point

Uniform Heating Type

Graoh showing MILA5000-P-F Maximum heating rate with a nickel plate sample.

Image Credit: Orton Ceramic Foundation

MILA5000-P-F Maximum heating rate

Sample: 20 (W) × 20 (L) × 0.5 (t) (all mm) nickel plate

Atmosphere: Vacuum

Rating: 200 V 1 kW, 100 % output

Graph showing MILA5000-P-F Temperature uniformity using a nickel plate sample.

Image Credit: Orton Ceramic Foundation

MILA5000-P-F Temperature uniformity

Sample: 20 (W) × 20 (L) × 0.5 (t) (all mm) nickel plate

Atmosphere: N2 Gas flow

TCKmeasuring point

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