FIB-SEM Workbench for Advanced Nanofabrication Applications - TESCAN SOLARIS

TESCAN SOLARIS is a turn-key FIB-SEM solution for the fabrication of nanostructures and nanotechnology-inspired microscale functional devices. TESCAN SOLARIS combines the most precise Focused Ion Beam with UHR-SEM featuring TriLens™ immersion optics, to ensure the best possible connection between ion beam milling and ultra-high-resolution SEM imaging.

The Orage™ Ga+ FIB column was designed to meet increasingly stringent focused ion beam nanofabrication requirements. With its ultimate FIB resolution, a broad range of beam current choices and advanced patterning control with TESCAN DrawBeam™, the Orage™ FIB column routinely fabricates even the most complicated structures. Optional automation modules facilitate batch processing and unattended execution of predefined operations, like TEM lamella preparation or creating arrays of structures.

TESCAN SOLARIS features the Triglav™ SEM column with immersion optics to deliver a crossover-free electron beam path, assuring excellent high-resolution performance through the entire range of beam energies. A field-free analytical mode is available for microanalysis and characterization of materials affected by the immersion magnetic field, as well as for live SEM observation of the milling process. Triglav™ also includes both in-column secondary and backscattered electron detectors. A large analytical vacuum chamber can accommodate a wide range of chamber-mounted detectors and analytical accessories.

Advanced nanofabrication with TESCAN SOLARIS can be enhanced further with optional gas injectors and a wide range of gas precursors for ion beam deposition or selective etching. An electrostatic beam blanker option for the SEM column facilitates nanopatterning by electron beam.

Powered by TESCAN Essence™, our modular customizable graphical user interface, TESCAN SOLARIS easily transforms from a multiuser, multi-purpose workstation, to a workflow-optimized turn-key solution for repetitive nanofabrication tasks.

Key Benefits

  • Best-in-class ion beam performance Ĭ Crossover-free ultra-high-resolution SEM imaging
  • High precision nanopatterning engine for electron and ion beams
  • Multiple gas injection system options with a variety of precursor gases
  • Chamber extension options for up to 12“wafer inspection
  • Easy-to-use modular software user interface Ĭ Python scripting interface for advanced user-defined experiments

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