TESCAN's NanoSpace is a user-friendly, multipurpose system particularly developed to work under Ultra-High Vacuum (UHV) conditions.
The NanoSpace system can be configured either as a scanning electron microscope (SEM) or as a dual-beam platform that integrates a high-performance Focused Ion Beam (FIB) and a SEM.
The UHV instrument has a modular design that enables a wide range of FIB and SEM columns corresponding with the particular requirements and goals of end-users. It also provides the most optimal, complete, and tailored solution for surface analysis and FIB nano-machining on specimens requiring the most stringent contamination-free environment.
The NanoSpace can even be fitted with a UHV-compatible Gas Injection System (GIS) for selective etching and local metal deposition.
In-situ connection to third-party systems, like surface analysis instruments and MBE clusters, is also feasible via a UHV intermediate chamber. This connectivity extends the application scope of the NanoSpace instrument.
- Fully customizable system
- Full UHV design—contamination-free environment
- Developed to conduct high-quality surface analysis
- Precise sample control
- High-resolution imaging
- UHV connection is available
- Completely automated instrument