The UVISEL ellipsometer series available from HORIBA Scientific delivers a seamless combination of performance and modularity for characterization of sophisticated thin film, surface and interface. The instrument leverages phase modulation technology to offer a strong optical design so as to cover the 142 to 2100 nm spectral range on a continuous basis. Data of high quality is delivered throughout the entire spectral range in terms of excellent signal to noise ratio, high resolution measurements and high accuracy.
The phase modulation technology in the ellipsometer helps in characterizing polarization variations at high frequency (50 kHz) without any mechanical movement. This promotes superior signal/noise ratio from the VUV to NIR, provides highly precise measurements for all values (Psi, Delta), and enables exceptionally fast data acquisition speed at about 50 ms/point, which is suitable for in-situ real-time measurements and kinetic studies.
In contrast to traditional ellipsometers that use rotating elements, precision and high sensitivity to characterize thin films can be realized with the help of the UVISEL ellipsometer. Moreover, the UVISEL can characterize thick layers of up to 30 µm and detect extremely thin films or interfaces which are not possible with other ellipsometers
Configurations of the UVISEL ellipsometer are flexible and come with six spectral ranges which include FUV, visible, VUV, NIR and two expanded ranges from 142 to 2100 and 190 to 2100 nm. Accessories and automation features enable users to complement the capabilities of the system to suit their experiments’ requirement. The UVISEL’s modular design allows the instrument to be utilized for roll to roll machines, in-situ integration on process chambers, or as a benchtop metrology tool. The UVISEL’s latest configuration includes a small, integrated goniometer to offer a benchtop metrology tool which is cost-effective.
The DeltaPsi2 software platform controls the UVISEL ellipsometer which is a standard feature in all thin film metrology tools available from HORIBA Scientific. The software platform offers a complete measurement and modelling solution which helps meet regular as well as sophisticated thin film applications.
For challenging industry and QC analysis, research, semiconductor fields, photovoltaic, display, optical coatings, chemical, biological and optoelectronic applications, the UVISEL offers an optimal solution for accurate characterization of thin film structures.
Product features of the UVISEL Spectroscopic Ellipsometer are:
- Modular design
- Extended spectral range from 142 to 2100 nm
- High precision and sensitivity
- Completely integrated software package for modeling, measurement and automatic operations
The data obtained using the UVISEL Spectroscopic Ellipsometer are:
- Surface and interface roughness
- Thin film thickness ranges between 1Å and 30 µm
- Optical constants (n,k) for graded, isotropic and anisotropic films v
- Derived optical data like optical bandgap Eg, absorption coefficient a,
- Material properties: compound alloy porosity, composition, morphology, crystallinity and more
- Mueller matrix
Specifications of the UVISEL Spectroscopic Ellipsometer are provided in the table below:
||142 to 2100 nm (depending on model)
||Psi = 45 +/- 0.02 degrees, Delta = 0 +/- 0.02 degrees
|Angle of Incidence
||35 to 90 Degrees (Depending on Configuration)
||1A to 30 um