The Crossbeam 340 and Crossbeam 540 FIB-SEM-Microscopes from ZEISS provide high productivity with an open 3D nano-workstation. Such microscopes help to expedite tomography runs utilizing up to 100 nA FIB current with unusual spot profiles to link the gap between micro- and nanopatterning.
Crossbeam enables the combination of the imaging and analytical performance of the GEMINI column with the ability of a next-generation FIB utilized for sample preparation and material processing on a nanoscopic scale.
High throughput nanofabrication and nanotomography of even the hardest, charging or magnetic samples could be achieved by utilizing the open and simply extendable software architecture and the modular platform idea of this 3D nano-workstation.
Gain More Information in Less Time
- Analyze big fields of view of up to 50 k x 40 k pixels with the optional ATLAS 3D package and GEMINI technology
- Expedite nanofabrication and nanotomography by integrating low kV SEM performance with FIB currents ranging up to 100 nA
- Users can gain the utmost data using multi-detector acquisition and the potential to mill and image at the same time
Keep Full Process Control
- Simple to comprehend graphical user interface
- Profit from an even beam profile and the utmost stability during exacting long-term experiments
- System parameters can be altered like probe current or acceleration voltage in real-time during acquisition, without making any adjustments to the image
Experience Maximum Flexibility
- The system should be tailored for in situ experiments
- The open application programming interface (API) enables users to access every microscope parameter
- It comes with a range of accessories and detectors to easily upgrade the Crossbeam
Crossbeam 340 with GEMINI I VP
- The special GEMINI material contrast with the optional Inlens Duo detector can be achieved
- Profit from utmost sample flexibility in multi-purpose surroundings
- Outgassing or charging samples could be utilized to execute in situ experiments
Crossbeam 540 with GEMINI II
- Users can benefit from special material and topographical contrast with concurrent EsB imaging and Inlens SE
- High-resolution imaging and quick analytics allows additional data to be achieved in less time
- The double condenser system offers high resolution even at low voltage and high current
Perform Material Ablation and Fabrication
An optional laser could be utilized to upgrade the Crossbeam to achieve profits from the quickest technology for strong ablation. Collectively with the high current FIB, fabrication of functional structures like microfluidic devices and MEMS ranging from the millimeter to the nanometer range.
Users can unfold deeply buried target areas or trim soft samples where mechanical preparation results in delamination, compression or smearing. Material ablation and fabrication could be executed in a single well-integrated system by making use of the laser option and the crossbeam.
Remote Application Programming Interface Helps Customizing the ZEISS Crossbeam
Users can access nearly every single microscope parameter that has been enabled by the open programming interface of Crossbeam.
Regulate electron and ion optics, detectors, stage, vacuum system, scanning and image acquisition from custom programs, thereby running on the system PC or a remote workstation.