| Title: |
Plasmatherm Reactive Ion Etch System 790 RIE |
| Company: |
Capovani Brothers Inc. |
| Location: |
Scotia, NY, USA |
| Email: |
cbi@capovani.com |
|
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|
| Description: |
| |
|
|
Manufacturer |
Plasmatherm |
Model |
790 11" RIE |
|
Wafer Size Range |
|
|
Minimum |
50 mm |
|
Maximum |
200 mm |
Process |
Reactive Ion Etch System |
|
Controller Type |
PC Controller Type |
High Vacuum Pump |
Leybold 361C |
|
RF Generator Model |
RFPP 5S |
Number of Gas Inputs |
Four Gas |
|
Power Requirements |
208 V 60 Hz
3 Phase |
Year of Manufacture |
1993 |
|
Exterior Dimensions |
|
|
Width |
24.000 in (61.0 cm) |
|
Depth |
40.000 in (101.6 cm) |
Height |
69.000 in (175.3 cm) |
|
Weight |
604 lb (274 kg) |
|
| Close Date: |
November 30, 2015 |
| Phone: |
Capovani Brothers Inc. +1 (518) 346-8347 |
| Email: |
cbi@capovani.com |