Wafer XRD 300: The Integratable Wafer Orientation Solution

Wafer XRD 300

The Integratable Wafer Orientation Solution

Harness the potential of factory automation with cutting-edge X-Ray diffraction technology. The Wafer XRD 300 stands as an ultra-fast, high-precision metrology module designed for crystal orientation and wafer geometry control.

Crystal Orientation Solutions: Ultra-Fast Crystal Orientation

Image Credit: Malvern Panalytical Ltd

Overview

Introducing the Wafer XRD 300: a high-speed X-Ray diffraction module tailored for 300 mm wafer production, offering crucial data on essential parameters like crystal orientation and geometric features including notches, flats, and more. Engineered to seamlessly integrate into the process line.

Features and Benefits

Ultra-Fast Precision With the Proprietary Scan Technology

The employed method necessitates just a single rotational scan to collect all essential data, enabling a comprehensive determination of crystal orientation with high precision within a very brief measuring time—typically in the range of a few seconds.

Fully Automated Handling and Sorting

Wafer XRD 300 is crafted to optimize throughput and productivity. Seamless integration into the handling and sorting automation renders it a potent and efficient addition to the process.

Crystal Orientation Solutions: Ultra-Fast Crystal Orientation

Image Credit: Malvern Panalytical Ltd

Easy Connectivity

The robust automation of Wafer XRD 300 seamlessly integrates into the new or existing process, offering compatibility with MES like SECS/GEM.

Crystal Orientation Solutions: Ultra-Fast Crystal Orientation

Image Credit: Malvern Panalytical Ltd

High Precision, Deeper Insight

Gain unparalleled insights into the materials with Wafer XRD 300's crucial measurements, including:

  • Crystal orientation
  • Notch position, depth, and opening angle
  • Diameter
  • Flat position and length
  • Additional sensors available upon request

The standard deviation tilt (for example, Si 100) in the Azimuthal-scan typically falls below <0.003 °.

Powerful and Versatile

As semiconductor research evolves, it has never been more important to measure a variety of samples. Wafer XRD 300 makes analysis easy and fast for hundreds of materials, including:

  • Si
  • SiC
  • AlN
  • GaAs
  • Quartz
  • Al2O3 (sapphire)
  • LiNbO3
  • BBO

Key Applications

Production and Processing

The Wafer XRD 300 is at the forefront of the transformation brought about by advancements in automation, offering a pragmatic and potent solution for managing orientation measurements at unprecedented speeds.

Quality Control

Wafer XRD 300 provides unmatched efficiency and versatility for production quality control, delivering highly accurate results in under 10 seconds. Tailored for 300 mm production environments, it excels in seamless integration into custom automation setups.

Specifications

Source: Malvern Panalytical Ltd

. .
Throughput 10000+ Wafer per Month
Wafer geometry  On request
Tilt precision 0.003
XRD axis vs notch / flat position 0.03 °

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