The JBX-3050MV series is an electron beam lithography system for mask/reticle fabrication that satisfies the 45–32 nm design rule.
Using advanced technology, this system can write patterns quickly, accurately, and reliably.
Key Product Features
Source: JEOL USA, Inc.
| . |
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| Exposure Method |
Vector scan, Variable-shaped beam |
| Accelerating Voltage |
50 kV |
| Electron Gun Emitter |
LaB6 single crystal |
| Pattan |
≤ ± 4 nm (3 δ) |
| Writing Position Accuracy |
≤ ± 10 nm |